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About Overview Organization & Management Strategy Open Positions Movie Library Access Research Structure Researchers & Laboratories Research Areas Three Advanced Target Projects Collaboration Achievements Press Releases Media & Award AIMResearch Publications Topics News Seminars & Symposium International Satellites International Partner Institutions Inter-Faculty Exchange Agreements Researcher Exchange Programs Support Support Systems For International Researchers (IAC) For Visitors Researchers for Visitors for Researchers for Enterprise Access AIMR Fund Japanese About AIMR Access Advanced Institute for Materials Research (AIMR), Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577 Japan Phone: +81-22-217-5922 / FAX: +81-22-217-5129 From Narita Airport From Haneda Airport From Sendai Airport From Sendai Station On foot About 15 minutes walk from the West Exit of Sendai Station. By subway Take the subway Tozai Line from Sendai Station to Aobadori Ichibancho Station (About 2 minutes). Exit at South 1. Walk from the exit about 10 minutes. Take the subway Namboku Line from Sendai Station to Itsutsubashi Station (About 2 minutes). Exit at North 2 or North 4. Walk from the exit about 10 minutes. By taxi About 10 minutes by taxi from the West Exit on the first floor of Sendai Station to the North Gate of Katahira Campus. By bus Take a city bus bound for either Yagiyama-Dobutsu-Koen, Midorigaoka-3-chome or Nishi-Koukou-Iriguchi via Otamaya-bashi from platform 11 at the Sendai Station West side bus terminal. Get off at Tohoku-dai-Seimon-Mae. Related Information For Visitors About AIMR Overview Message from the Director Message from the President History AIMR Main Building WPI & WPI Academy Organization & Management Top Management AIMR Advisory Board Strategy Research Strategic Plan Partner Institutions Open Positions Access Movie Library Home About AIMR Access TOHOKU UNIVERSITY World Premier International Research Center Initiative For AIMR Members Link Site map Copyright © 2020 Tohoku University. All Rights Reserved.